{"id":26,"date":"2018-11-12T06:14:22","date_gmt":"2018-11-12T06:14:22","guid":{"rendered":"https:\/\/devops.gtiit.edu.cn\/wp\/leunggroup\/?page_id=26"},"modified":"2024-10-29T17:33:26","modified_gmt":"2024-10-29T17:33:26","slug":"research-interests","status":"publish","type":"page","link":"https:\/\/sites.gtiit.edu.cn\/baron-lab\/?page_id=26","title":{"rendered":"Facilities"},"content":{"rendered":"\t\t
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Characterization<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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Time-of- Flight Secondary Ion Mass Spectrometry-TOF-SIMS<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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TOFSIMS (Time-of-Flight Secondary Ion Mass Spectrometry) is a powerful surface analysis technique that can provide high-resolution, high-sensitivity chemical composition analysis and imaging of solid surfaces. By using laser or ion beam irradiation on the sample surface, TOFSIMS generates a large amount of secondary ions that are collected and analyzed by mass spectrometry. This allows researchers to determine the chemical composition, structure, and distribution on the sample surface with high precision and accuracy, even at sub-micron spatial resolution. TOFSIMS is widely used in materials science, biomedical research, nanotechnology, and other fields to analyze compound distribution, surface chemical reactions, cell component analysis, and more. Its high resolution and sensitivity make it an invaluable tool for understanding the properties of surfaces and interfaces, including multi-layered structures and depth profiles. Overall, TOFSIMS is a critical analytical tool that has greatly contributed to the advancement of surface science and technology.<\/p>

Established in 2022, our lab at RB07 is equipped with state-of-the-art TOF.SIMS 5 instrumentation, offering unparalleled capabilities in surface characterization, depth profiling, and molecular imaging. We serve as a focal point for researchers exploring surface composition and structure at the molecular level. Our dedicated team provides comprehensive support, from experimental design to data analysis, to help you achieve your research goals. Whether you’re from academia or industry, we welcome you to leverage our expertise and resources.<\/p>

Applications:<\/strong>
\u25cf Thin films<\/strong>
\u25cf Polymers<\/strong>
\u25cf Paints and Coatings<\/strong>
\u25cf Semiconductors<\/strong>
\u25cf and more\u2026<\/strong><\/p>\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t

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Thermal desorption spectrometry \u2013 TDS<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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Thermal desorption spectroscopy (TDS), also known as temperature programmed desorption (TPD) is the method of observing desorbed molecules from a surface when the surface temperature is increased. When molecules or atoms come in contact with a surface, they adsorb onto it, minimizing their energy by forming a bond with the surface. The binding energy varies with the combination of the adsorbate and surface. If the surface is heated, at one point, the energy transferred to the adsorbed species will cause it to desorb. The temperature at which this happens is known as the desorption temperature.<\/p>

Applications:<\/strong>
\u25cf Thin films<\/strong>
\u25cf Photovoltaics<\/strong>
\u25cf Hydrogen in metals<\/strong>
\u25cf Semiconductors<\/strong>
\u25cf and more\u2026<\/strong><\/p>\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t

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Differential Electrochemical Mass Spectrometry \u2013 DEMS<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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DEMS technique combines electrochemical half-cell reaction experiment with mass spectrometry. This combination allows measurements and correlation of the the electrode current and mass resolved determination of DEMS technique combines electrochemical half-cell reaction experiments with mass spectrometry. This combination allows measurements and correlation of the electrode current and mass resolved determination of gaseous or volatile electrochemical reactants, reaction intermediates and products in real-time. The instrument essential consists of three crucial components: an electrochemical half-cell, a PTFE membrane interface, and a vacuum system including the quadrupole mass spectrometer (QMS).<\/p>

Applications:<\/strong>
\u25cf Fuel Cells<\/strong>
\u25cf Li Batteries<\/strong>
\u25cf Electrochemical reduction of atmospheric carbon<\/strong>
\u25cf and more\u2026<\/strong><\/p>\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t

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Superconducting QUantum Interference Device - SQUID<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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SQUID is an extremely sensitive magnetic flux measurement device that detects changes in the magnetic field based on flux neutralization and the Josephson effect. SQUID is capable of detecting very weak magnetic fields with a sensitivity several orders of magnitude higher than conventional magnetometers, and can detect magnetic fields as low as 10^-11^ gauss.<\/p>\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t

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\n\t\t\t\t\t\t\t\t\t\t\t\t\"\"\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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<\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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Electrochemical workstation \u2013 ECW (Autolab)<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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  • Metrohm Autolab PGSTAT302N \u2013 ECW<\/li>
  • with FRA32M & Dual mode bipotentiostat module<\/li>
  • AUT.RRDE: Rotating-Ring Disk Electrode (R-RDE, 5mm dia)<\/li><\/ul><\/div><\/div>\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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    Anodizing<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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    Metals anodizing workstation (CC\/CV)<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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    • Keithley source meter (Model no.: 2611B),<\/li>
    • Switchable constant current (CC) or constant voltage (CV)<\/li>
    • Max. current = 10 A\u00a0\u25cf<\/strong>\u00a0Max. voltage = 200 V\u00a0\u25cf<\/strong>\u00a0Rated power = 30 kV.<\/li><\/ul>\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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      Coating technology<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t
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      Atomic layer deposition (ALD)<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t
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      Atomic layer deposition\uff08ALD\uff09is a surface chemistry process of thin film deposition method which enables extremely precise control of film thickness and composition. This method is characterized by the atomic layer as a unit which ensures its smaller and more demanding structures. ALD is widely used in the semiconductor or battery industry for the preparation of high-quality, high-precision films. It has shown great promise in emerging semiconductor and energy conversion technologies.<\/p>\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t

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      Synthesis<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t
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      Microwave synthesis reactor (MAS-II plus)<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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      \n\t\t\t\t\t\t\t\t\t\t\t\t\"\"\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t
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      • MW source: 2450MHz\uff0c0-1000W, non-pulse<\/li>
      • Temp monitor\/control: IR (0-900\u2103) & Pt100 (0-300\u2103).<\/li>
      • Maximum operating temperature: 300\u2103.<\/li>
      • Reaction observation: Camera with 7\u2019\u2019 color monitor.<\/li>
      • Stirring: Magnetic Or Mechanical (30-1700 RPM).<\/li><\/ul>\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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        <\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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        Ultrasonic Processor \u2013 SXSONIC<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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        • Model: FS-300N\u00a0<\/li>
        • Frequency: 20 KHz<\/li>
        • Output Power: 300 W<\/li>
        • Impulse gap : 1 s \u2013 99 min<\/li>
        • Sono-rod tip: \u03a68mm<\/li>
        • Sono-rod tip material: Titanium (TI-6AL-4V)<\/li>
        • Volume cap. : 5 \u2013 200 mL<\/li>
        • Power adjustable:\u00a00 \u2013 100%<\/li><\/ul>\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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          Heater and magnetic stirrer<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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          • Model: SH-II-4C (heater + stirrer + temp. probe)<\/li><\/ul>
              • Speed:\u00a0200-2000 rpm<\/li>
              • Max temp: 350<\/li>
              • Sensor: PT100<\/li><\/ul><\/li>
              • Model: ZGCJ-3A (stirrer)
                • Speed:\u00a00-3000 rpm<\/li><\/ul><\/li><\/ul>\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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                  <\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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                  Analytical and precision balance<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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                  \n\t\t\t\t\t\t\t\t\t\t\t\t\"\"\t\t\t\t\t\t\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t
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                  • OHAUS Adventurer<\/li>
                  • Model no. AX523<\/li>
                  • Max. wt. = 520 g<\/li>
                  • Min. wt. = 0.001 g<\/li><\/ul>\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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                    <\/div>\n\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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                    Quartz Crystal Microbalance QCM200<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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                    The instrument read the resonant frequency and resistance
                    of a 5 MHz, AT-cut quartz crystal. The resonant frequency
                    changes as a linear function of the mass of material deposited
                    on the crystal surface. The resistance at resonance changes
                    with the viscosity \/ elasticity of the material (film or liquid) in
                    contact with the crystal surface.
                    As a gravimetric instrument, the QCM200 can measure
                    mass ranging from micrograms to fractions of a nanogram.
                    Detection limits correspond to submonolayers of atoms.<\/p>\t\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t

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                    Electrochemical workstation<\/h2>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t
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                    Auto Lab PGSTAT302N\n\n<\/h3>\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t
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                    \n\t\t\t\t\t\t\t
                    \n\t\t\t\t\t\t
                    \n\t\t\t\t
                    \n\t\t\t\t\t\t\t\t
                    \n\t\t\t\t

                    Main parameters:<\/p>